Next Generation Device Technology
Research Description
R&D platform for next-generation device technology.Research Focuses
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High-density, high-performance/low-power integration device technologies
- Vertical stacked fin/nanowire/nanosheet transistors
- Ultrathin gate high-dielectric and ferroelectric materials
- High-mobility IV and III-V channel materials
- Two-dimensional channel materials
- Si-based quantum computing device technology
R&D Results
High-density, high-performance, low-power 3D stacked device transistor device technologies that meet the requirements of academic and industrial applications.Provided domestic R&D teams with an R&D platform that is up to the industrial standard to facilitate research and development of advanced devices.